SF-100 systems are elegantly simple, easy to use micro patterning systems. Through their unique patented design, the system allows users to fabricate microdevices quickly and easily.

Smart Filter Technology provides the means for easy and efficient optical processing utilizing the SF-100. This technique utilizes reflective microoptoelectromechanical (MOEM) elements to spatially modulate light such that light can be controlled simultaneously over a field of view which provides over 750,000 individual pixels.  Each SF-100 system includes a Smart Filter subassembly that incorporates all of the hardware and control software needed to produce these images in real time.

Figure 1 shows a schematic of a typical SF-100 system. Designs are drawn using conventional engineering design or drawing programs. These designs are then transferred to the SF-100 host computer for use on the system. The SF-100 computer is a standard personal computer that provides dual video output, one to the computer monitor and the other to the Smart Filter subassembly. The Smart Filter then modulates the appropriate MOEM elements which are used to produce the pattern.

A mercury arc lamp is the source of optical energy for the SF-100. Since g-line (435 nm), h-line (405 nm), and/or i-line (365 nm) energies are transmitted to the substrate surface, many standard optical materials are compatible with the SF-100. Light energy passes from the lamp to the Smart Filter subassembly through a variety of optical components needed to provide collimated and uniform energy over the entire exposure area. The light reflects off the Smart Filter assembly to provide the optical pattern. After passing through additional optical components, the pattern is projected onto the substrate. Most SF-100 systems include an automated stage assembly to provide substrate motion. This allows the substrate to be moved in three dimensions, providing alignment in two coplanar dimensions. An inline camera is used for feature registration and inspection of the exposed substrate pattern.

A UV filter is included in the light path to provide for image to substrate alignment. This sub-assembly provides for varying both the overall energy level and the individual wavelength(s) at the substrate surface. The optical components that allow for this variation can all be changed in less than 2 hours, allowing for customization of the exposure wavelength(s) and energy levels for each user.

Each SF-100 model is slightly different, to provide user specific solutions to our customers. Hence, some of the options discussed above may not be applicable to your specific SF-100 system. Check with your local IMP sales representative to learn more about which SF-100 system best suits your needs and how we can help you solve your most difficult technical problems.